H.Yamada, M. Sato and K. Shimoda
Department of Electronic Engineering, Gunma University,
1-5-1 Tenjin-cho, Kiryu, 376-8515, Japan
We reduced the number of the condensers to make lower the temperature of the
pinched plasma and generation of the soft X-ray was suppressed. We performed the
experiments with the grazing-incidence spectroscope to analyze the wavelengths of the
EUV light. From the spectral lines, generation of the EUV light of 13.5 nm was verified.
We improved our small plasma focus device to the gas-puff style to increase the EUV
output. In the gas-puff style, the peak value at the first peak became about twice higher
than that in the mixed gas style.
Keywords: plasma focus, EUV, gas-puff operation